VF-3000 Low-Cost Mini Batch Vertical Furnace
This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers.
We have achieved such a low price that back end users can introduce this furnace.
Ultra-high-temperature treatment is available and best suited for power device manufacturing.
- Low-cost equipment for back end users
- Mini batch, 50 to 75 wafers processing is available for R&D to mass-production line
- 4- to 8-inch wafer size is available
- Max 4 cassette stocks
- Excellent temperature control from low to medium high temperature range using an LGO heater
- High-speed wafer transfer using a single wafer handling robot
- Equipped with limited-function simple control system
This furnace can be used for a wide range of wafer sizes from 4-inch to 8-inch, and processing in 50–75 wafers of mini batches can be chosen. With the hardware and control system content carefully selected to achieve a low price, this vertical furnace can be used for a wide range of functions from R&D to mass-production lines. Choose and use a suitable heater from an LGO heater, molybdenum disilicide (MoSi2) heater and carbon heater not only for low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD, oxidation and diffusion but also for SiC power device gate silicon oxynitriding, activation annealing and other ultra-high-temperature treatment processes.
|Outer dimension||W1200×D1450×H2610 mm|
|Flat zone length||to 360 mm|
|Wafer size||4 to 8 inch|
|Batch size||Max. 75 wafers（50 wafers at 8 inch）|
|Number of cassette stock||4|
N2 load lock
Convertible wafer size
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